Congratulations on the acceptance of the manuscript (Authors: Huan Xie, et al.)

  June 26, 2021 Congratulations on the acceptance of the manuscript (Authors: Huan Xie, et al.) entitled " Facet Engineering to Regulate Surface States of Topological Crystalline Insulator Bismuth Rhombic Dodecahedrons for Highly Energy Efficient Electrochemical CO2 Reduction" by Advanced Materials.

Copyright:The Zhu’s Research Group. Technology Support:Technical support center
Phone:+86-0591-63173129,Mail:qlzhu@fjirsm.ac.cn
Address:155 Yangqiao Road West Fuzhou,350002,P.R.China
Fujian Institute of Research on the Structure of Matter Chinese Academy of Sciences
Baidu
sogou